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Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant File

Jung, Jae-Hun , Lee, Seung-Joon , Lee, Hyun-Jung , Lee, Min Young , Cheon, Taehoon , Bae, So Ik , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , et al

Article Issue Date2015-11 View3
Cu direct electrodeposition using step current for superfilling on Ru-Al2O3 layer File

Kim, Myung Jun , Choe, Seunghoe , Kim, Hoe Chul , Lee, Seung-Joon , Kim, Soo-Hyun , Kwon, Oh Joong , Kim, Jae Jeong

Article Issue Date2014-11 View2
Effects of annealing on the properties of atomic layer deposited Ru thin films deposited by NH3 and H-2 as reactants File

Lee, Seung-Joon , Kim, Soo-Hyun

Article Issue Date2016-08 View2
Highly Stable and Effective Doping of Graphene by Selective Atomic Layer Deposition of Ruthenium File

Kim, Minsu , Kim, Ki-Ju , Lee, Seung-Joon , Kim, Hyun-Mi , Cho, Seong-Yong , Kim, Min-Sik , Kim, Soo-Hyun , Kim, Ki-Bum

Article Issue Date2017-01 View5
Plasma-free atomic layer deposition of Ru thin films using H-2 molecules as a nonoxidizing reactant File

Lee, Seung-Joon , Kim, Soo-Hyun , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , Kim, Sangdeok , Yeom, Seungjin , Lee, Do-Joong

Article Issue Date2016-05 View1
Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen File

Yeo, Seungmin , Park, Ji-Yoon , Lee, Seung-Joon , Lee, Do-Joong , Seo, Jong Hyun , Kim, Soo-Hyun

Article Issue Date2015-04 View4
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